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・ Indium arsenide
・ Indium arsenide antimonide phosphide
・ Indium bromide
・ Indium chalcogenides
・ Indium chloride
・ Indium Corporation
・ Indium gallium aluminium nitride
・ Indium gallium arsenide
・ Indium gallium arsenide phosphide
・ Indium gallium nitride
・ Indium gallium phosphide
・ Indium gallium zinc oxide
・ Indium halides
・ Indium lung
・ Indium nitride
Indium phosphide
・ Indium tin oxide
・ Indium trihydride
・ Indium wire
・ Indium(I) bromide
・ Indium(III) bromide
・ Indium(III) chloride
・ Indium(III) fluoride
・ Indium(III) hydroxide
・ Indium(III) oxide
・ Indium(III) selenide
・ Indium(III) sulfate
・ Indium(III) sulfide
・ Indium(III) telluride
・ Indium-111


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Indium phosphide : ウィキペディア英語版
Indium phosphide

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Indium phosphide (InP) is a binary semiconductor composed of indium and phosphorus. It has a face-centered cubic ("zincblende") crystal structure, identical to that of GaAs and most of the III-V semiconductors.
==Manufacturing==
Indium phosphide is prepared from the reaction of white phosphorus and indium iodide at 400 °C. 〔(Indium Phosphide at HSDB )〕
==Uses==
InP is used in high-power and high-frequency electronics because of its superior electron velocity with respect to the more common semiconductors silicon and gallium arsenide. It also has a direct bandgap, making it useful for optoelectronics devices like laser diodes. InP is also used as a substrate for epitaxial indium gallium arsenide based opto-electronic devices.

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